On the Cooling of Electrons in a Silicon Inversion Layer

O. Prus, M. Reznikov, U. Sivan, V. Pudalov

Published 2001-08-01, updated 2001-08-07Version 2

The cooling of two-dimensional electrons in silicon-metal-oxide semiconductor field effect transistors is studied experimentally. Cooling to the lattice is found to be more effective than expected from the bulk electron-phonon coupling in silicon. Unexpectedly, the extracted heat transfer rate to phonons at low temperatures depends cubically on electron temperature, suggesting that piezoelectric coupling (absent in bulk silicon) dominates over deformation potential. According to our findings, at 100 mK, electrons farther than 0.1 mm from the contacts are mostly cooled by phonons. Using long devices and low excitation voltage we measure electron resistivity down to 100 mK and find that some of the "metallic" curves, reported earlier, turn insulating below about 300 mK. This finding renders the definition of the claimed 2D metal-insulator transition questionable. Previous low temperature measurements in silicon devices are analyzed and thumb rules for evaluating their electron temperatures are provided.