Preserving Twist-Angle in Marginally Twisted Double-Bilayer Graphene Devices During Fabrication

Hyeon-Woo Jeong, Jiho Kim, Boknam Chae, Kenji Watanabe, Takashi Taniguchi, Gil-Ho Lee

Published 2025-02-08Version 1

Twisted van der Waals heterostructures provide a platform for studying a wide range of electron correlation phenomena, including unconventional superconductivity and correlated insulating states. However, fabricating such devices is challenging due to the difficulty in achieving and maintaining homogeneous twist-angles. Here, we present a fabrication method to preserve the twist-angle with minimal deformation. We fabricated marginally twisted double-bilayer graphene (mTDBG) stacks and directly imaged the resulting triangular superlattice periodicity via scattering-type scanning near-field optical microscopy (s-SNOM). This technique enabled us to monitor twist-angle deformation at each fabrication step, paving the way for more reliable device fabrication and facilitating the exploration of twist-angle-dependent physics.