arXiv Analytics

Sign in

arXiv:1302.1057 [cond-mat.mes-hall]AbstractReferencesReviewsResources

Reactive-Ion-Etched Graphene Nanoribbons on a Hexagonal Boron Nitride Substrate

Dominik Bischoff, Tobias Krähenmann, Susanne Dröscher, Michelle A. Gruner, Clément Barraud, Thomas Ihn, Klaus Ensslin

Published 2013-02-05Version 1

We report on the fabrication and electrical characterization of both single layer graphene micron-sized devices and nanoribbons on a hexagonal boron nitride substrate. We show that the micron-sized devices have significantly higher mobility and lower disorder density compared to devices fabricated on silicon dioxide substrate in agreement with previous findings. The transport characteristics of the reactive-ion-etched graphene nanoribbons on hexagonal boron nitride, however, appear to be very similar to those of ribbons on a silicon dioxide substrate. We perform a detailed study in order to highlight both similarities as well as differences. Our findings suggest that the edges have an important influence on transport in reactive ion-etched graphene nanodevices.

Related articles: Most relevant | Search more
arXiv:1110.5702 [cond-mat.mes-hall] (Published 2011-10-26)
Quasiparticle bandgap engineering of graphene and graphone on hexagonal boron nitride substrate
arXiv:2104.07975 [cond-mat.mes-hall] (Published 2021-04-16)
The role of flexural coupling in heat dissipation from a two-dimensional layered material to its hexagonal boron nitride substrate
arXiv:1105.5710 [cond-mat.mes-hall] (Published 2011-05-28)
Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures