Reducing strain fluctuations in quantum dot devices by gate-layer stacking

Collin C. D. Frink, Benjamin D. Woods, Merritt P. Losert, E. R. MacQuarrie, Mark Friesen, M. A. Eriksson

Published 2023-12-14Version 1

Nanofabricated metal gate electrodes are commonly used to confine and control electrons in electrostatically defined quantum dots. However, these same gates impart a complicated strain geometry that affects the confinement potential and potentially impairs device functionality. Here we investigate strain-induced fluctuations of the potential energy in Si/SiGe heterostructures, caused by (i) lattice mismatch, (ii) materials-dependent thermal contraction, and (iii) deposition stress in the metal gates. By simulating different gate geometries, ranging from simple to realistically complicated, and including features like overlapping metal and oxide layers, we can explain most observed strain features. In particular, we show that strain-induced potential fluctuations can be suppressed by employing overlapping gates that cover the whole active region, when the oxide layers are thin. These results suggest that strain effects should not present a serious challenge to qubit uniformity when following simple design rules.