arXiv:2310.09029 [cond-mat.mes-hall]AbstractReferencesReviewsResources
Pushing the limits of ab-initio-NEGF transport using efficient dissipative Mode-Space algorithms for realistic simulations of low-dimensional semiconductors including their oxide interfaces
Published 2023-10-13Version 1
We investigate the trade-offs between accuracy and efficiency for several flavors of the dissipative mode-space NEGF algorithm with the self-consistent Born approximation for DFT Hamiltonians. Using these models, we then demonstrate the dissipative self-consistent DFT-NEGF simulations of realistic 2D-material devices including their oxide interfaces with large slab dimensions (up to 1000 atoms) and up to several 100,000 atoms in the full device, pushing the limit of ab-initio transport.
Journal: 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD2023)
Categories: cond-mat.mes-hall
Keywords: efficient dissipative mode-space algorithms, oxide interfaces, realistic simulations, ab-initio-negf transport, low-dimensional semiconductors
Tags: journal article
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