arXiv:1503.04150 [cond-mat.mes-hall]AbstractReferencesReviewsResources
Mapping the global phase diagram of quantum anomalous Hall effect
Xufeng Kou, Lei Pan, Jing Wang, Yabin Fan, Eun Sang Choi, Wei-Li Lee, Tianxiao Nie, Koichi Murata, Qiming Shao, Shou-Cheng Zhang, Kang L. Wang
Published 2015-03-13Version 1
After decades of searching for the dissipationless transport in the absence of any external magnetic field, quantum anomalous Hall effect (QAHE) was recently predicted and experimentally achieved in thin magnetic topological insulator (TI) films, where the quantized chiral edge conduction spontaneously occurred without invoking the formation of discrete Landau levels (LLs). However, the universal phase diagram of QAHE and its relation with quantum Hall effect (QHE) remain to be investigated. In this article, with two-dimensional (2D) quantum confinement, we report the experimental observation of the quantum phase transition between two QAHE states in the 6 quintuple-layer (QL) (Cr0.12Bi0.26Sb0.62)2Te3 film. Consistent with the theoretical prediction, zero Hall conductance plateau and the double-peaked longitudinal conductance at the coercive field are resolved up to 0.3 K, and they manifest the presence of the quantum anomalous Hall insulating state within the magnetic multi-domain network context. Moreover, by studying the angle-dependent quantum transport behaviors, the 2D massive Dirac fermion-featured QAHE phase diagram is mapped out to show that the QAHE state with the first Chern number C1 = 1 is transitioned into the C1 = 0 insulating state, and the conductance tensor follows a universal semicircle relation regardless of the applied magnetic field strength. Our results address that the quantum phase transitions in both QAHE and QHE regimes are in the same universality class, yet the microscopic details are different. In addition, the realization of the quantum anomalous Hall insulator from both the field-driven and angle-dependent experiments unveils new ways to explore quantum phase-related physics and applications.