Phase-sensitive bichromatic photoresistance in a two-dimensional electron gas

Q. Shi, M. Khodas, A. Levchenko, M. A. Zudov

Published 2013-12-11Version 1

We have studied microwave photoresistance in a two-dimensional electron system subject to two radiation fields (frequencies $\omega_1$ and $\omega_2$) using quantum kinetic equation. We have found that when $\omega_2/\omega_1= 1 + 2/N$, where $N$ is an integer, and both waves have the same polarization, the displacement mechanism gives rise to a new, phase-sensitive photoresistance. This photoresistance oscillates with the magnetic field and can be a good fraction of the total photoresistance under typical experimental conditions. The inelastic mechanism, on the other hand, gives zero phase-sensitive photoresistance if the radiation fields are circularly polarized.