Takehito Yokoyama, Yaroslav Tserkovnyak
Published 2013-10-12, updated 2013-12-14Version 2
We study spin and charge diffusion in metallic-ferromagnet/topological-insulator junctions. The coupled diffusion equations are derived perturbatively with respect to the strength of the interlayer tunneling. We calculate spin accumulation in the ferromagnet and junction magnetoresistance associated with a current bias along the interface.
Comments: 7 pages, 1 figure
Journal: Phys. Rev. B 89, 035408 (2014)
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