Atomistic mechanisms and diameter selection during nanorod growth

Da-Jun Shu, Xiang Xiong, Zhao-Wu Wang, Zhenyu Zhang, Mu Wang, Nai-Ben Ming

Published 2010-02-05, updated 2010-03-01Version 2

We study in this paper the atomic mechanisms of nanorod growth and propose the way of diameter selection of nanorod. A characteristic radius is demonstrated to be crucial in nanorod growth, which increases proportional to one fifth power of the ratio of the interlayer hopping rate of adatoms across the monolayer steps to the deposition rate. When the radius of the initial island is larger than this characteristic radius, the growth morphology evolves from a taper-like structure to a nanorod with radius equal to the characteristic radius after some transient layers. Otherwise the nanorod morphology can be maintained during the growth, with stable radius being limited by both the radius of the initial island and the three-dimensional Ehrlich-Schwoebel barrier. Therefore different growth modes and diameter of nanorod can be selected by tuning the characteristic radius. The theoretical predictions are in good agreement with experimental observations of ZnO growth.