arXiv Analytics

Sign in

arXiv:0802.1292 [cond-mat.dis-nn]AbstractReferencesReviewsResources

Atomistic Origin of Urbach Tails in Amorphous Silicon

Y. Pan, F. Inam, M. Zhang, D. A. Drabold

Published 2008-02-10Version 1

Exponential band edges have been observed in a variety of materials, both crystalline and amorphous. In this paper, we infer the structural origins of these tails in amorphous and defective crystalline Si by direct calculation with current {\it ab initio} methods. We find that exponential tails appear in relaxed models of diamond with suitable point defects. In amorphous silicon (a-Si), we find that structural filaments of short bonds and long bonds exist in the network, and that the tail states near the extreme edges of both band tails are are also filamentary, with much localization on the structural filaments. We connect the existence of both filament systems to structural relaxation in the presence of defects and or topological disorder.

Related articles: Most relevant | Search more
arXiv:1004.3199 [cond-mat.dis-nn] (Published 2010-04-19, updated 2010-04-20)
Evolution of the potential-energy surface of amorphous silicon
arXiv:1808.09119 [cond-mat.dis-nn] (Published 2018-08-28)
Effect of low-temperature annealing on the void-induced microstructure in amorphous silicon: A computational study
arXiv:1901.08620 [cond-mat.dis-nn] (Published 2019-01-24)
Atomistic simulation of nearly defect-free models of amorphous silicon: An information-based approach