{ "id": "1509.03896", "version": "v1", "published": "2015-09-13T20:34:38.000Z", "updated": "2015-09-13T20:34:38.000Z", "title": "High-Mobility Holes in Dual-Gated WSe$_2$ Field-Effect Transistors", "authors": [ "Hema C. P. Movva", "Amritesh Rai", "Sangwoo Kang", "Kyounghwan Kim", "Babak Fallahazad", "Takashi Taniguchi", "Kenji Watanabe", "Emanuel Tutuc", "Sanjay K. Banerjee" ], "comment": "18 pages, 5 figures, 7 supporting figures, ACS Nano 2015", "doi": "10.1021/acsnano.5b04611", "categories": [ "cond-mat.mes-hall", "cond-mat.mtrl-sci" ], "abstract": "We demonstrate dual-gated $p$-type field-effect transistors (FETs) based on few-layer tungsten diselenide (WSe$_2$) using high work-function platinum source/drain contacts, and a hexagonal boron nitride top-gate dielectric. A device topology with contacts underneath the WSe$_2$ results in $p$-FETs with $I_{ON}$/$I_{OFF}$ ratios exceeding 10$^7$, and contacts that remain Ohmic down to cryogenic temperatures. The output characteristics show current saturation and gate tunable negative differential resistance. The devices show intrinsic hole mobilities around 140 cm$^2$/Vs at room temperature, and approaching 4,000 cm$^2$/Vs at 2 K. Temperature-dependent transport measurements show a metal-insulator transition, with an insulating phase at low densities, and a metallic phase at high densities. The mobility shows a strong temperature dependence consistent with phonon scattering, and saturates at low temperatures, possibly limited by Coulomb scattering, or defects.", "revisions": [ { "version": "v1", "updated": "2015-09-13T20:34:38.000Z" } ], "analyses": { "keywords": [ "field-effect transistors", "high-mobility holes", "dual-gated wse", "tunable negative differential resistance", "hexagonal boron nitride top-gate dielectric" ], "tags": [ "journal article" ], "publication": { "publisher": "ACS" }, "note": { "typesetting": "TeX", "pages": 18, "language": "en", "license": "arXiv", "status": "editable" } } }