{ "id": "1301.2813", "version": "v4", "published": "2013-01-13T19:50:15.000Z", "updated": "2013-03-28T12:49:07.000Z", "title": "Intrinsic carrier mobility of multi-layered MoS$_2$ field-effect transistors on SiO$_2$", "authors": [ "N. R. Pradhan", "D. Rhodes", "Q. Zhang", "S. Talapatra", "M. Terrones", "P. M. Ajayan", "L. Balicas" ], "comment": "8 pages, 5 figures, typos fixed, and references updated", "journal": "Appl. Phys. Lett. 102, 123105 (2013)", "categories": [ "cond-mat.mes-hall", "cond-mat.other" ], "abstract": "By fabricating and characterizing multi-layered MoS$_2$-based field-effect transistors (FETs) in a four terminal configuration, we demonstrate that the two terminal-configurations tend to underestimate the carrier mobility $\\mu$ due to the Schottky barriers at the contacts. For a back-gated two-terminal configuration we observe mobilities as high as 125 cm$^2$V$^{-1}$s$^{-1}$ which is considerably smaller than 306.5 cm$^2$V$^{-1}$s$^{-1}$ as extracted from the same device when using a four-terminal configuration. This indicates that the intrinsic mobility of MoS$_2$ on SiO$_2$ is significantly larger than the values previously reported, and provides a quantitative method to evaluate the charge transport through the contacts.", "revisions": [ { "version": "v4", "updated": "2013-03-28T12:49:07.000Z" } ], "analyses": { "subjects": [ "85.30.Tv" ], "keywords": [ "intrinsic carrier mobility", "field-effect transistors", "multi-layered mos", "intrinsic mobility", "four-terminal configuration" ], "tags": [ "journal article" ], "publication": { "doi": "10.1063/1.4799172", "journal": "Applied Physics Letters", "year": 2013, "month": "Mar", "volume": 102, "number": 12, "pages": 123105 }, "note": { "typesetting": "TeX", "pages": 8, "language": "en", "license": "arXiv", "status": "editable", "adsabs": "2013ApPhL.102l3105P" } } }