{ "id": "1007.0240", "version": "v2", "published": "2010-07-01T19:38:12.000Z", "updated": "2010-07-03T00:03:32.000Z", "title": "Chip-scale nanofabrication of single spins and spin arrays in diamond", "authors": [ "David M. Toyli", "Christoph D. Weis", "Gregory D. Fuchs", "Thomas Schenkel", "David D. Awschalom" ], "comment": "This paper has been withdrawn by the authors. 14 pages, 3 figures; Posting has been removed due to editorial request from ACS Nano Letters; This version has been removed by arXiv admin because it contains an inappropriate withdrawal notice", "journal": "Nano Lett., Article ASAP (2010)", "doi": "10.1021/nl102066q", "categories": [ "cond-mat.mes-hall", "cond-mat.mtrl-sci", "quant-ph" ], "abstract": "We demonstrate a technique to nanofabricate nitrogen vacancy (NV) centers in diamond based on broad-beam nitrogen implantation through apertures in electron beam lithography resist. This method enables high-throughput nanofabrication of single NV centers on sub-100 nm length scales. Secondary ion mass spectroscopy (SIMS) measurements facilitate depth profiling of the implanted nitrogen to provide three-dimensional characterization of the NV center spatial distribution. Measurements of NV center coherence with on-chip coplanar waveguides suggest a pathway for incorporating this scalable nanofabrication technique in future quantum applications.", "revisions": [ { "version": "v2", "updated": "2010-07-03T00:03:32.000Z" } ], "analyses": { "keywords": [ "single spins", "spin arrays", "chip-scale nanofabrication", "electron beam lithography resist", "method enables high-throughput nanofabrication" ], "tags": [ "journal article" ], "publication": { "journal": "Nano Letters", "year": 2010, "month": "Aug", "volume": 10, "number": 8, "pages": 3168 }, "note": { "typesetting": "TeX", "pages": 14, "language": "en", "license": "arXiv", "status": "editable", "adsabs": "2010NanoL..10.3168T" } } }