{
  "id": "0807.4033",
  "version": "v1",
  "published": "2008-07-25T09:03:56.000Z",
  "updated": "2008-07-25T09:03:56.000Z",
  "title": "Nanomachining of multilayer graphene using an atomic force microscope",
  "authors": [
    "P. Barthold",
    "T. Luedtke",
    "R. J. Haug"
  ],
  "comment": "5 pages, 4 figures",
  "categories": [
    "cond-mat.mes-hall"
  ],
  "abstract": "An atomic force microscope is used to structure a film of multilayer graphene. The resistance of the sample was measured in-situ during nanomachining a narrow trench. We found a reversible behavior in the electrical resistance which we attribute to the movement of dislocations. After several attempts also permanent changes are observed. Two theoretical approaches are presented to approximate the measured resistance.",
  "revisions": [
    {
      "version": "v1",
      "updated": "2008-07-25T09:03:56.000Z"
    }
  ],
  "analyses": {
    "keywords": [
      "atomic force microscope",
      "multilayer graphene",
      "nanomachining",
      "narrow trench",
      "permanent changes"
    ],
    "note": {
      "typesetting": "TeX",
      "pages": 5,
      "language": "en",
      "license": "arXiv",
      "status": "editable",
      "adsabs": "2008arXiv0807.4033B"
    }
  }
}